LRIS: Slitmasks | ||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||
Facility Slitmask InventoryThe following standard slitmasks are available for use with LRIS.
Multi Object SlitmasksMultiobject Slitmasks are used by observers who desire to acquire more than one spectrum at a time. Prior to your run, slits are milled into sheets of aluminum by summit staff to prepair your slitmasks as specified in design files submitted to the slitmask database (see table below). The masks are then inserted into LRIS during the afternoon of your observing session. In practice, there are eight free slots available for user slitmasks. There are ten positions available, but two are reserved for "direct" imaging and a grid of "focus holes" used to focus the instrument in the afternoon.Designing new slitmasks?Please review the different slitmask procedures and the design tips page at the bottom of the table. Most observers use the Autoslit3 software to design their masks. Mask-Design-Files (MDFs) are currently submitted via a Web Form (LRIS/DEIMOS Slitmask submission database ). Masks will be milled automatically after they are successfully ingested in the database. Please follow the Slitmask Design Submission Procedure to submit a mask for milling. Below is a table of information that you may find useful in regards to slitmasks.
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