The Slitmask Database
The slitmask processing system maintains slitmask
information in a database, currently residing in California. To
submit slitmask files for milling, LRIS observers use the
same web forms that DEIMOS observers user.
To use the LRIS/DEIMOS slitmask
submission web form, observers must register and may need to
request access for their Internet domain.
Registering with the Slitmask Acceptance System
To verify that you can access the web pages, you should register
with the system as soon as possible by following this procedure:
Submitting a Mask Design File
You may submit an LRIS or DEIMOS Mask
Design File as follows (the procedure is identical for the two
instruments):
Verifying Your Slitmask
After submitting mask design files, you should check that they
have been ingested into the system properly by listing your
slitmask inventory:
For each mask, the page provides a dropdown menu to do various things:
- Archive. Archiving a mask sets the status of the
mask so it no longer is in the Milling Queue or Available
for use. The mask remains in the database, however, it
must be set to ReMill (and be remilled) if the mask is
to be used (again).
- Remill.
After being milled, masks are marked "done" so that they
don't pop up again in the "to be milled" list. To make
another copy of a mask that has been milled already, you
will need to mark it "unmilled" using the Remill button.
NOTE: it is a Bad Idea to use the "Remill" button to use a
slitmask from a previous run, since the date of observation
will be wrong and this will goof up the slitmask milling
list. Instead, regenerate the mask design file with
DSIMULATOR and submit the revised version.
- Plot.
The Plot button is not dangerous. It shows you a graphical
representation of your mask design.
- FITS file.
The FITS file button is not dangerous. It generates a 'FITS
chunk' for any mask design. Note that this takes a long
time to generate and is probably not interesting to you.
- Detail.
The Detail button is not dangerous. It shows you in
terrifying detail all the data contained in your mask design
and blueprint(s).
You'll receive immediate feedback regarding any problems
with the content of your slitmask files.
You'll be warned via email if alignment boxes are not
present on your slitmasks.
You can quickly generate plots of your slitmasks to
verify the layout of the slits.
If you accidentally give two of your masks the same
nickname, an automatic data quality checker will rename the
second and subsequent masks to guarantee uniqueness.
You can easily request that masks be dropped from the
queue, or that old masks be entered into the mill queue again.
You'll be sent email updates on the status of your masks,
indicating whether they've been milled or not, and you can
check the status of your masks via the web pages at any time.
Slitmask Policies
- Slit Mask Files for those using multislit masks with LRIS or DEIMOS with less than 200 slits are required FOUR weeks prior to the observing run. Masks with greater than 200 slits are required EIGHT weeks prior to the observing run. Beginning with semester 2005B (1 August 2005) we will begin to charge for late submittal of mask designs unless sufficient scientific justification is provided. Please read the Policy on slitmask incentives for further information.
- Masks submitted after the four week deadline will go to the end of
the slitmask queue and be milled after the completion of all
on-time masks, even if the on-time masks were submitted after
the late masks.
- We understand that certain time-critical observing
programs (i.e., supernova searches) require that masks be
designed and milled within a day or two of the run. CARA will
continue to support such bona fide time-critical requests when
possible. To request permission for late slitmask design files,
please contact Dr. Bob Goodrich (rgoodrich) at the keck observatory
and provide him with the scientific justification for the request.